Nowakowski, Krystian ORCID: 0000-0002-4598-9831, Zandvliet, Harold J. W. and Bampoulis, Pantelis ORCID: 0000-0002-2347-5223 (2019). Barrier Inhomogeneities in Atomic Contacts on WS2. Nano Lett., 19 (2). S. 1190 - 1197. WASHINGTON: AMER CHEMICAL SOC. ISSN 1530-6992

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Abstract

The down-scaling of electrical components requires a proper understanding of the physical mechanisms governing charge transport. Here, we have investigated atomic-scale contacts and their transport characteristics on WS2 using conductive atomic force microscopy (c-AFM). We demonstrate that c-AFM can provide true atomic resolution, revealing atom vacancies, adatoms, and periodic modulations arising from electronic effects. Moreover, we find a lateral variation of the surface conductivity that arises from the lattice periodicity of WS2. Three distinct sites are identified, i.e., atop, bridge, and hollow. The current transport across these atomic metal-semiconductor interfaces is understood by considering thermionic emission and Fowler-Nordheim tunnelling. Current modulations arising from point defects and the contact geometry promise a novel route for the direct control of atomic point contacts in diodes and devices.

Item Type: Journal Article
Creators:
CreatorsEmailORCIDORCID Put Code
Nowakowski, KrystianUNSPECIFIEDorcid.org/0000-0002-4598-9831UNSPECIFIED
Zandvliet, Harold J. W.UNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Bampoulis, PantelisUNSPECIFIEDorcid.org/0000-0002-2347-5223UNSPECIFIED
URN: urn:nbn:de:hbz:38-157693
DOI: 10.1021/acs.nanolett.8b04636
Journal or Publication Title: Nano Lett.
Volume: 19
Number: 2
Page Range: S. 1190 - 1197
Date: 2019
Publisher: AMER CHEMICAL SOC
Place of Publication: WASHINGTON
ISSN: 1530-6992
Language: English
Faculty: Unspecified
Divisions: Unspecified
Subjects: no entry
Uncontrolled Keywords:
KeywordsLanguage
TRANSITION; CONDUCTANCEMultiple languages
Chemistry, Multidisciplinary; Chemistry, Physical; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Physics, Applied; Physics, Condensed MatterMultiple languages
Refereed: Yes
URI: http://kups.ub.uni-koeln.de/id/eprint/15769

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