Universität zu Köln

Hoppius, Jan S., Bialuschewski, Danny, Mathur, Sanjay, Ostendorf, Andreas ORCID: 0000-0002-3601-6392 and Gurevich, Evgeny L. (2018). Femtosecond laser crystallization of amorphous titanium oxide thin films. Appl. Phys. Lett., 113 (7). MELVILLE: AMER INST PHYSICS. ISSN 1077-3118

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Abstract

In this paper, we demonstrate experimentally that crystalline phases appear in amorphous titanium oxide upon processing with ultrafast laser pulses. Amorphous titanium thin films were produced by plasma-enhanced chemical vapor deposition and exposed to femtosecond laser pulses. Formation of a rutile phase was confirmed by X-ray diffraction, Raman measurements, and electron backscattering diffraction. A range of processing parameters for the crystallization is reported, and possible background mechanisms are discussed. Published by AIP Publishing.

Item Type:	Journal Article
Creators:	Creators Email ORCID ORCID Put Code Hoppius, Jan S. UNSPECIFIED UNSPECIFIED UNSPECIFIED Bialuschewski, Danny UNSPECIFIED UNSPECIFIED UNSPECIFIED Mathur, Sanjay UNSPECIFIED UNSPECIFIED UNSPECIFIED Ostendorf, Andreas UNSPECIFIED orcid.org/0000-0002-3601-6392 UNSPECIFIED Gurevich, Evgeny L. UNSPECIFIED UNSPECIFIED UNSPECIFIED
URN:	urn:nbn:de:hbz:38-176532
DOI:	10.1063/1.5027899
Journal or Publication Title:	Appl. Phys. Lett.
Volume:	113
Number:	7
Date:	2018
Publisher:	AMER INST PHYSICS
Place of Publication:	MELVILLE
ISSN:	1077-3118
Language:	English
Faculty:	Faculty of Mathematics and Natural Sciences
Divisions:	Faculty of Mathematics and Natural Sciences > Department of Chemistry > Institute of Inorganic Chemistry
Subjects:	no entry
Uncontrolled Keywords:	Keywords Language WAVE-GUIDES; SILICON; GLASS; MICROSTRUCTURES; ABLATION Multiple languages Physics, Applied Multiple languages
Refereed:	Yes
URI:	http://kups.ub.uni-koeln.de/id/eprint/17653