Universität zu Köln

Juergensen, Lasse, Frank, Michael, Pyeon, Myeongwhun, Czympiel, Lisa and Mathur, Sanjay (2017). Subvalent Iridium Precursors for Atom-Efficient Chemical Vapor Deposition of Ir and IrO2 Thin Films. Organometallics, 36 (12). S. 2331 - 2338. WASHINGTON: AMER CHEMICAL SOC. ISSN 1520-6041

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Abstract

A new heteroleptic Ir(I) compound exhibiting high volatility and defined thermal decomposition under CVD conditions is reported. The new iridium precursor [(COD)Ir(ThTFP)] (COD = cyclooctadiene, ThTFP = (Z)-3,3,3-trifluoro,1-(thiazol-2-yl)prop-1-en-2-olate) unifies both reactivity and sufficient stability through its heteroleptic constitution to provide a precise control over compositional purity in CVD deposits. The solution integrity Of the monomeric Ir(I) complex was investigated by 1D and 2D NMR spectroscopy and EI mass spectrometry, whereas the molecular structure was confirmed by single-crystal diffraction. CVD experiments demonstrated the suitability of the iridium compound for an atom-efficient (high molecule-to-precursot yield) gas-phase deposition of nanocrystalline iridium films that could be converted into crystalline iridium dioxide upon heat treatment to demonstrate their electrocatalytic potential in the oxygen evolution reaction.

Item Type:	Journal Article
Creators:	Creators Email ORCID ORCID Put Code Juergensen, Lasse UNSPECIFIED UNSPECIFIED UNSPECIFIED Frank, Michael UNSPECIFIED UNSPECIFIED UNSPECIFIED Pyeon, Myeongwhun UNSPECIFIED UNSPECIFIED UNSPECIFIED Czympiel, Lisa UNSPECIFIED UNSPECIFIED UNSPECIFIED Mathur, Sanjay UNSPECIFIED UNSPECIFIED UNSPECIFIED
URN:	urn:nbn:de:hbz:38-227201
DOI:	10.1021/acs.organomet.7b00275
Journal or Publication Title:	Organometallics
Volume:	36
Number:	12
Page Range:	S. 2331 - 2338
Date:	2017
Publisher:	AMER CHEMICAL SOC
Place of Publication:	WASHINGTON
ISSN:	1520-6041
Language:	English
Faculty:	Unspecified
Divisions:	Unspecified
Subjects:	no entry
Uncontrolled Keywords:	Keywords Language OXYGEN EVOLUTION REACTION; LAYER DEPOSITION; WATER OXIDATION; OXIDE; PLATINUM; ELECTROCATALYSTS; URANIUM(IV); COMPLEXES; PALLADIUM; RHODIUM Multiple languages Chemistry, Inorganic & Nuclear; Chemistry, Organic Multiple languages
Refereed:	Yes
URI:	http://kups.ub.uni-koeln.de/id/eprint/22720