Universität zu Köln

Straub, Mark D., Leduc, Jennifer, Frank, Michael, Raauf, Aida, Lohrey, Trevor D. ORCID: 0000-0003-3568-7861, Minasian, Stefan G., Mathur, Sanjay and Arnold, John ORCID: 0000-0001-9671-227X (2019). Chemical Vapor Deposition of Phase-Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors. Angew. Chem.-Int. Edit., 58 (17). S. 5749 - 5754. WEINHEIM: WILEY-V C H VERLAG GMBH. ISSN 1521-3773

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Abstract

Homoleptic uranium(IV) amidate complexes have been synthesized and applied as single-source molecular precursors for the chemical vapor deposition of UO2 thin films. These precursors decompose by alkene elimination to give highly crystalline phase-pure UO2 films with an unusual branched heterostructure.

Item Type:	Journal Article
Creators:	Creators Email ORCID ORCID Put Code Straub, Mark D. UNSPECIFIED UNSPECIFIED UNSPECIFIED Leduc, Jennifer UNSPECIFIED UNSPECIFIED UNSPECIFIED Frank, Michael UNSPECIFIED UNSPECIFIED UNSPECIFIED Raauf, Aida UNSPECIFIED UNSPECIFIED UNSPECIFIED Lohrey, Trevor D. UNSPECIFIED orcid.org/0000-0003-3568-7861 UNSPECIFIED Minasian, Stefan G. UNSPECIFIED UNSPECIFIED UNSPECIFIED Mathur, Sanjay UNSPECIFIED UNSPECIFIED UNSPECIFIED Arnold, John UNSPECIFIED orcid.org/0000-0001-9671-227X UNSPECIFIED
URN:	urn:nbn:de:hbz:38-150658
DOI:	10.1002/anie.201901924
Journal or Publication Title:	Angew. Chem.-Int. Edit.
Volume:	58
Number:	17
Page Range:	S. 5749 - 5754
Date:	2019
Publisher:	WILEY-V C H VERLAG GMBH
Place of Publication:	WEINHEIM
ISSN:	1521-3773
Language:	English
Faculty:	Faculty of Mathematics and Natural Sciences
Divisions:	Faculty of Mathematics and Natural Sciences > Department of Chemistry > Institute of Inorganic Chemistry
Subjects:	no entry
Uncontrolled Keywords:	Keywords Language ZIRCONIUM; COMPLEXES; TITANIUM; OXIDES; OXIDATION; HAFNIUM Multiple languages Chemistry, Multidisciplinary Multiple languages
Refereed:	Yes
URI:	http://kups.ub.uni-koeln.de/id/eprint/15065