Podhorsky, Jan, Murauskas, Tomas, Hegemann, Corinna, Graf, David, Fischer, Thomas, Babiak, Michal, Pinkas, Jiri ORCID: 0000-0002-6234-850X, Plausinaitiene, Valentina, Mathur, Sanjay, Abrutis, Adulfas and Moravec, Zdenek (2018). Preparation of Heteroleptic Tin(IV) N,O-beta-Heteroarylalkenolate Complexes and Their Properties as PI-MOCVD Precursors for SnO2 Deposition. Eur. J. Inorg. Chem. (46). S. 5027 - 5036. WEINHEIM: WILEY-V C H VERLAG GMBH. ISSN 1099-0682

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Abstract

We have successfully prepared and structurally characterized five novel tin(IV) heteroleptic N,O-beta-heteroarylalkenolates containing -CF3 groups. The synthetic route used reactions of Sn(OtBu)(4) with 3,3,3-trifluoro(pyridin-2-yl)propen-2-ol (PyTFPH), 3,3,3-trifluoro(dimethyl-1,3-oxazol-2-yl)propen-2-ol (DMOTFPH), and 3,3,3-trifluoro(1,3-benzthiazol-2-yl)propen-2-ol (BTTFPH) in dry aprotic solvents leading to elimination of tert-butanol and formation of Sn(OtBu)(2)(PyTFP)(2) (1), Sn(OtBu)(2)(DMOTFP)(2) (2), and Sn(OtBu)(2)(BTTFP)(2) (3). The chelating ligands employed a bidentate N boolean AND O donor set. The reactivity of OtBu groups in the obtained Sn(OtBu)(2)(N boolean AND O)(2) complexes was further investigated in reactions with fluorinated alcohols, 2,2,2-trifluoroethanol (TFEH) and 1,1,1,3,3,3-hexafluoro-2-propanol (HFPH). Two complexes Sn(TFE)(2)(DMOTFP)(2) (4) and Sn(HFP)(2)(PyTFP)(2) (5) were obtained and structurally characterized. Thermal behavior of complexes 1-5 was studied by thermogravimetry and differential scanning calorimetry (TG/DSC). The most volatile compounds Sn(OtBu)(2)(PyTFP)(2) (1) and Sn(OtBu)(2)(DMOTFP)(2) (2) were chosen and tested in a PI-MOCVD process for the SnO2 growth on sapphire-C substrates. Film growth rates at different temperatures (500-900 degrees C), crystalline quality, surface roughness, transparency in UV/Vis-mid-IR spectral ranges have been investigated. The results showed that these two compounds are suitable precursors for MOCVD deposition of high quality SnO2 films. Fabricated films displayed good response to CO and NO2 in chemo-resistive gas sensing measurements.

Item Type: Journal Article
Creators:
CreatorsEmailORCIDORCID Put Code
Podhorsky, JanUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Murauskas, TomasUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Hegemann, CorinnaUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Graf, DavidUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Fischer, ThomasUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Babiak, MichalUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Pinkas, JiriUNSPECIFIEDorcid.org/0000-0002-6234-850XUNSPECIFIED
Plausinaitiene, ValentinaUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Mathur, SanjayUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Abrutis, AdulfasUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Moravec, ZdenekUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
URN: urn:nbn:de:hbz:38-162107
DOI: 10.1002/ejic.201800913
Journal or Publication Title: Eur. J. Inorg. Chem.
Number: 46
Page Range: S. 5027 - 5036
Date: 2018
Publisher: WILEY-V C H VERLAG GMBH
Place of Publication: WEINHEIM
ISSN: 1099-0682
Language: English
Faculty: Faculty of Mathematics and Natural Sciences
Divisions: Faculty of Mathematics and Natural Sciences > Department of Chemistry > Institute of Inorganic Chemistry
Subjects: no entry
Uncontrolled Keywords:
KeywordsLanguage
CHEMICAL-VAPOR-DEPOSITION; ALKOXIDE COMPOUNDS; SOLID-STATE; OXIDE; FILMS; SENSORS; SURFACE; DESIGN; SODIUM; OXYGENMultiple languages
Chemistry, Inorganic & NuclearMultiple languages
Refereed: Yes
URI: http://kups.ub.uni-koeln.de/id/eprint/16210

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