Universität zu Köln

Sasinska, Alexander, Ritschel, Daniel, Czympiel, Lisa and Mathur, Sanjay (2017). Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors. Adv. Eng. Mater., 19 (2). WEINHEIM: WILEY-V C H VERLAG GMBH. ISSN 1527-2648

Full text not available from this repository.

Abstract

The authors, report here on the deposition of metallic copper thin films by plasma-assisted atomic layer deposition (ALD) with an air stable and volatile precursor-[Cu((Py)CHCOCF3)(2)](2) (Py=pyridine)-that stands out due to its facile synthesis and easy handling under ambient conditions. Copper thin films are obtained by decomposing [Cu((Py)CHCOCF3)(2)](2) in hydrogen plasma in a concomitant deposition and recrystallization process. The thermal stability of the precursor prevents thermally induced decomposition, which allows precise control over thickness and film homogeneity. Electrical measurements of the as-deposited samples show clear interdependence of sheet resistance on the substrates surface roughness, thereby, films with higher roughness show higher resistance. Combined X-Ray photoelectron spectroscopy of Cu 2p peak and Cu LMM peak, as well as resistivity values of 58(-1) confirm the high quality of copper films without the need of further annealing steps under reducing atmosphere.

Item Type:	Journal Article
Creators:	Creators Email ORCID ORCID Put Code Sasinska, Alexander UNSPECIFIED UNSPECIFIED UNSPECIFIED Ritschel, Daniel UNSPECIFIED UNSPECIFIED UNSPECIFIED Czympiel, Lisa UNSPECIFIED UNSPECIFIED UNSPECIFIED Mathur, Sanjay UNSPECIFIED UNSPECIFIED UNSPECIFIED
URN:	urn:nbn:de:hbz:38-240274
DOI:	10.1002/adem.201600593
Journal or Publication Title:	Adv. Eng. Mater.
Volume:	19
Number:	2
Date:	2017
Publisher:	WILEY-V C H VERLAG GMBH
Place of Publication:	WEINHEIM
ISSN:	1527-2648
Language:	English
Faculty:	Faculty of Mathematics and Natural Sciences
Divisions:	Faculty of Mathematics and Natural Sciences > Department of Chemistry > Institute of Inorganic Chemistry
Subjects:	no entry
Uncontrolled Keywords:	Keywords Language RAY PHOTOELECTRON-SPECTROSCOPY; CHEMICAL-STATES; CU; SILICON; SURFACE; OXIDE; OXIDATION; XPS; RESISTIVITY; BEHAVIOR Multiple languages Materials Science, Multidisciplinary Multiple languages
Refereed:	Yes
URI:	http://kups.ub.uni-koeln.de/id/eprint/24027