Universität zu Köln

Singh, Trilok ORCID: 0000-0003-2322-7403, Lehnen, Thomas, Leuning, Tessa and Mathur, Sanjay (2015). Atomic layer deposition grown MOx thin films for solar water splitting: Prospects and challenges. J. Vac. Sci. Technol. A, 33 (1). MELVILLE: A V S AMER INST PHYSICS. ISSN 1520-8559

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Abstract

The magnitude of energy challenge not only calls for efficient devices but also for abundant, inexpensive, and stable photoactive materials that can enable efficient light harvesting, charge separation and collection, as well as chemical transformations. Photoelectrochemical systems based on semiconductor materials have the possibility to transform solar energy directly into chemical energy the so-called solar hydrogen. The current challenge lies in the harvesting of a larger fraction of electromagnetic spectrum by enhancing the absorbance of electrode materials. In this context, atomically precise thin films of metal oxide semiconductors and their multilayered junctions are promising candidates to integrate high surface areas with well-defined electrode-substrate interface. Given its self-limited growth mechanism, the atomic layer deposition (ALD) technique offers a wide range of capabilities to deposit and modify materials at the nanoscale. In addition, it opens new frontiers for developing precursor chemistry that is inevitable to design new processes. Herein, the authors review the properties and potential of metal oxide thin films deposited by ALD for their application in photoelectrochemical water splitting application. The first part of the review covers the basics of ALD processes followed by a brief discussion on the electrochemistry of water splitting reaction. The second part focuses on different MOx films deposited by atomic layer deposition for water splitting applications; in this section, The authors discuss the most explored MOx semiconductors, namely, Fe2O3, TiO2, WO3, and ZnO, as active materials and refer to their application as protective coatings, conductive scaffolds, or in heterojunctions. The third part deals with the current challenges and future prospects of ALD processed MOx thin films for water splitting reactions. (C) 2014 American Vacuum Society.

Item Type:	Journal Article
Creators:	Creators Email ORCID ORCID Put Code Singh, Trilok UNSPECIFIED orcid.org/0000-0003-2322-7403 UNSPECIFIED Lehnen, Thomas UNSPECIFIED UNSPECIFIED UNSPECIFIED Leuning, Tessa UNSPECIFIED UNSPECIFIED UNSPECIFIED Mathur, Sanjay UNSPECIFIED UNSPECIFIED UNSPECIFIED
URN:	urn:nbn:de:hbz:38-419226
DOI:	10.1116/1.4904729
Journal or Publication Title:	J. Vac. Sci. Technol. A
Volume:	33
Number:	1
Date:	2015
Publisher:	A V S AMER INST PHYSICS
Place of Publication:	MELVILLE
ISSN:	1520-8559
Language:	English
Faculty:	Faculty of Mathematics and Natural Sciences
Divisions:	Faculty of Mathematics and Natural Sciences > Department of Chemistry > Institute of Inorganic Chemistry
Subjects:	no entry
Uncontrolled Keywords:	Keywords Language IRON-OXIDE; CHARGE-TRANSFER; HEMATITE; PHOTOOXIDATION; PHOTOANODES; ALPHA-FE2O3; ELECTRODES; REDUCTION; THICKNESS; OXIDATION Multiple languages Materials Science, Coatings & Films; Physics, Applied Multiple languages
Refereed:	Yes
URI:	http://kups.ub.uni-koeln.de/id/eprint/41922