Universität zu Köln

Engler, Martin ORCID: 0000-0002-6593-0677, Frost, Frank, Mueller, Sven, Macko, Sven, Will, Moritz, Feder, Rene ORCID: 0000-0002-5694-5332, Spemann, Daniel, Huebner, Rene, Facsko, Stefan ORCID: 0000-0003-3698-3793 and Michely, Thomas (2014). Silicide induced ion beam patterning of Si(001). Nanotechnology, 25 (11). BRISTOL: IOP PUBLISHING LTD. ISSN 1361-6528

Full text not available from this repository.

Abstract

Low energy ion beam pattern formation on Si with simultaneous co-deposition of Ag, Pd, Pb, Ir, Fe or C impurities was investigated by in situ scanning tunneling microscopy as well as ex situ atomic force microscopy, scanning electron microscopy, transmission electron microscopy and Rutherford backscattering spectrometry. The impurities were supplied by sputter deposition. Additional insight into the mechanism of pattern formation was obtained by more controlled supply through e-beam evaporation. For the situations investigated, the ability of the impurity to react with Si, i.e. to form a silicide, appears to be a necessary, but not a sufficient condition for pattern formation. Comparing the effects of impurities with similar mass and nuclear charge, the collision kinetics is shown to be not of primary importance for pattern formation. To understand the observed phenomena, it is necessary to assume a bi-directional coupling of composition and height fluctuations. This coupling gives rise to a sensitive dependence of the final morphology on the conditions of impurity supply. Because of this history dependence, the final morphology cannot be uniquely characterized by a steady state impurity concentration.

Item Type:	Journal Article
Creators:	Creators Email ORCID ORCID Put Code Engler, Martin UNSPECIFIED orcid.org/0000-0002-6593-0677 UNSPECIFIED Frost, Frank UNSPECIFIED UNSPECIFIED UNSPECIFIED Mueller, Sven UNSPECIFIED UNSPECIFIED UNSPECIFIED Macko, Sven UNSPECIFIED UNSPECIFIED UNSPECIFIED Will, Moritz UNSPECIFIED UNSPECIFIED UNSPECIFIED Feder, Rene UNSPECIFIED orcid.org/0000-0002-5694-5332 UNSPECIFIED Spemann, Daniel UNSPECIFIED UNSPECIFIED UNSPECIFIED Huebner, Rene UNSPECIFIED UNSPECIFIED UNSPECIFIED Facsko, Stefan UNSPECIFIED orcid.org/0000-0003-3698-3793 UNSPECIFIED Michely, Thomas UNSPECIFIED UNSPECIFIED UNSPECIFIED
URN:	urn:nbn:de:hbz:38-443205
DOI:	10.1088/0957-4484/25/11/115303
Journal or Publication Title:	Nanotechnology
Volume:	25
Number:	11
Date:	2014
Publisher:	IOP PUBLISHING LTD
Place of Publication:	BRISTOL
ISSN:	1361-6528
Language:	English
Faculty:	Unspecified
Divisions:	Unspecified
Subjects:	no entry
Uncontrolled Keywords:	Keywords Language SELF-ORGANIZATION; SI1-XGEX FILMS; BOMBARDMENT; SURFACE; SI; SIMULATION; EVOLUTION; AG; NANOSTRUCTURES; BACKSCATTERING Multiple languages Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Physics, Applied Multiple languages
URI:	http://kups.ub.uni-koeln.de/id/eprint/44320