Singh, Trilok ORCID: 0000-0003-2322-7403, Lehnen, Thomas, Leuning, Tessa, Sahu, Diptiranjan and Mathur, Sanjay (2014). Thickness dependence of optoelectronic properties in ALD grown ZnO thin films. Appl. Surf. Sci., 289. S. 27 - 33. AMSTERDAM: ELSEVIER. ISSN 1873-5584

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Abstract

ZnO thin films with high conductivity and high transparency were grown on Si (1 0 0) substrates by atomic layer deposition. Thickness dependent (43-225 nm) changes in crystallographic, optical and electrical properties are reported and discussed. Increase in film thickness caused a decrease in the bandgap by relaxation of stress in the plane of the film and led to an improvement in crystallinity and conductivity. The optical studies showed a noticeable change towards the contribution of excitonic and phonon replica to the UV-emission band. (C) 2013 Elsevier B.V. All rights reserved.

Item Type: Journal Article
Creators:
CreatorsEmailORCIDORCID Put Code
Singh, TrilokUNSPECIFIEDorcid.org/0000-0003-2322-7403UNSPECIFIED
Lehnen, ThomasUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Leuning, TessaUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Sahu, DiptiranjanUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Mathur, SanjayUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
URN: urn:nbn:de:hbz:38-448504
DOI: 10.1016/j.apsusc.2013.10.071
Journal or Publication Title: Appl. Surf. Sci.
Volume: 289
Page Range: S. 27 - 33
Date: 2014
Publisher: ELSEVIER
Place of Publication: AMSTERDAM
ISSN: 1873-5584
Language: English
Faculty: Faculty of Mathematics and Natural Sciences
Divisions: Faculty of Mathematics and Natural Sciences > Department of Chemistry > Institute of Inorganic Chemistry
Subjects: no entry
Uncontrolled Keywords:
KeywordsLanguage
ATOMIC LAYER DEPOSITION; OPTICAL-PROPERTIES; SURFACE-CHEMISTRY; METALLIC ZN; ZINC-OXIDE; TEMPERATURE; STRAIN; SEMICONDUCTORS; NANOPARTICLES; SUBSTRATEMultiple languages
Chemistry, Physical; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed MatterMultiple languages
Refereed: Yes
URI: http://kups.ub.uni-koeln.de/id/eprint/44850

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