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Thesis Abstract
Wang, Shuangzhou (2025). Atomic Layer Deposition of Vanadium Oxide and Tantalum Oxide Thin Films for Resistive Switching Applications - Abstract. Thesis Abstract, Universität zu Köln.
Wang, Shuangzhou (2025). Atomic Layer Deposition of Vanadium Oxide and Tantalum Oxide Thin Films for Resistive Switching Applications - Abstract. Thesis Abstract, Universität zu Köln.