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Atomic Layer Deposition Fabrication of nanoscaled films and heterostructures from mono- and bimetallic precursors

Leuning, Tessa Martine (2014) Atomic Layer Deposition Fabrication of nanoscaled films and heterostructures from mono- and bimetallic precursors. [Thesis Abstract]

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      Item Type: Thesis Abstract
      Creators:
      CreatorsEmail
      Leuning, Tessa Martinetleuning@uni-koeln.de
      URN: urn:nbn:de:hbz:38-55322
      Series Name: Anorganische Chemie
      Publisher: Verlag Dr. Hut
      ISBN: 978-3-8439-1459-8
      Subjects: Chemistry and allied sciences
      Uncontrolled Keywords:
      KeywordsLanguage
      Atomic Layer Deposition, Bimetallic precursors, ZnO, Heterostructures, Thin films, Gas sensingEnglish
      Faculty: Mathematisch-Naturwissenschaftliche Fakultät
      Divisions: Mathematisch-Naturwissenschaftliche Fakultät > Institut für Anorganische Chemie
      Language: English
      Date: 16 January 2014
      Date Type: Publication
      Date of oral exam: 16 January 2014
      Full Text Status: Public
      Date Deposited: 31 Mar 2014 15:03:04
      URI: http://kups.ub.uni-koeln.de/id/eprint/5532

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