Universität zu Köln

Brune, Veronika ORCID: 0000-0001-5909-621X, Grosch, Matthias, Weissing, Rene ORCID: 0000-0001-5726-0688, Hartl, Fabian ORCID: 0000-0003-0687-1029, Frank, Michael, Mishra, Shashank ORCID: 0000-0003-2846-4221 and Mathur, Sanjay (2021). Influence of the choice of precursors on the synthesis of two-dimensional transition metal dichalcogenides. Dalton Trans., 50 (36). S. 12365 - 12386. CAMBRIDGE: ROYAL SOC CHEMISTRY. ISSN 1477-9234

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Abstract

The interest in transition metal dichalcogenides (TMDCs; MEy/2; M = transition metal; E = chalcogenide, y = valence of the metal) has grown exponentially across various science and engineering disciplines due to their unique structural chemistry manifested in a two-dimensional lattice that results in extraordinary electronic and transport properties desired for applications in sensors, energy storage and optoelectronic devices. Since the properties of TMDCs can be tailored by changing the stacking sequence of 2D monolayers with similar or dis-similar materials, a number of synthetic routes essentially based on the disintegration of bulk (e.g., chemical exfoliation) or the integration of atomic constituents (e.g., vapor phase growth) have been explored. Despite a large body of data available on the chemical synthesis of TMDCs, experimental strategies with high repeatability of control over film thickness, phase and compositional purity remain elusive, which calls for innovative synthetic concepts offering, for instance, self-limited growth in the z-direction and homogeneous lateral topography. This review summarizes the recent conceptual advancements in the growth of layered van der Waals TMDCs from both mixtures of metal and chalcogen sources (multi-source precursors; MSPs) and from molecular compounds containing metals and chalcogens in one starting material (single-source precursor; SSPs). The critical evaluation of the strengths, limitations and opportunities of MSP and SSP approaches is provided as a guideline for the fabrication of TMDCs from commercial and customized molecular precursors. For example, alternative synthetic pathways using tailored molecular precursors circumvent the challenges of differential nucleation and crystal growth kinetics that are invariably associated with conventional gas phase chemical vapor transport (CVT) and chemical vapor deposition (CVD) of a mixture of components. The aspects of achieving high compositional purity and alternatives to minimize competing reactions or side products are discussed in the context of efficient chemical synthesis of TMDCs. Moreover, a critical analysis of the potential opportunities and existing bottlenecks in the synthesis of TMDCs and their intrinsic properties is provided.

Item Type:	Journal Article
Creators:	Creators Email ORCID ORCID Put Code Brune, Veronika UNSPECIFIED orcid.org/0000-0001-5909-621X UNSPECIFIED Grosch, Matthias UNSPECIFIED UNSPECIFIED UNSPECIFIED Weissing, Rene UNSPECIFIED orcid.org/0000-0001-5726-0688 UNSPECIFIED Hartl, Fabian UNSPECIFIED orcid.org/0000-0003-0687-1029 UNSPECIFIED Frank, Michael UNSPECIFIED UNSPECIFIED UNSPECIFIED Mishra, Shashank UNSPECIFIED orcid.org/0000-0003-2846-4221 UNSPECIFIED Mathur, Sanjay UNSPECIFIED UNSPECIFIED UNSPECIFIED
URN:	urn:nbn:de:hbz:38-577987
DOI:	10.1039/d1dt01397a
Journal or Publication Title:	Dalton Trans.
Volume:	50
Number:	36
Page Range:	S. 12365 - 12386
Date:	2021
Publisher:	ROYAL SOC CHEMISTRY
Place of Publication:	CAMBRIDGE
ISSN:	1477-9234
Language:	English
Faculty:	Unspecified
Divisions:	Unspecified
Subjects:	no entry
Uncontrolled Keywords:	Keywords Language CHEMICAL-VAPOR-DEPOSITION; SINGLE-SOURCE PRECURSORS; ATOMIC LAYER DEPOSITION; ONE-POT SYNTHESIS; LOW-TEMPERATURE SYNTHESIS; ATMOSPHERIC-PRESSURE CVD; CHARGE-DENSITY WAVES; LARGE-AREA SYNTHESIS; SULFIDE THIN-FILMS; FEW-LAYER Multiple languages Chemistry, Inorganic & Nuclear Multiple languages
URI:	http://kups.ub.uni-koeln.de/id/eprint/57798