Items where Author or Editor is "Appel, Linus" - Kölner UniversitätsPublikationsServer

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Number of items: 7.

Journal Article

Appel, Linus, Fiz, Raquel, Tyrra, Wieland, Pantenburg, Ingo and Mathur, Sanjay (2015). Design of Volatile Mixed-Ligand Tantalum(V) Compounds as Precursors to Ta2O5 Films. Cryst. Growth Des., 15 (3). S. 1141 - 1150. WASHINGTON: AMER CHEMICAL SOC. ISSN 1528-7505

Appel, Linus, Fiz, Raquel, Tyrra, Wieland, Pantenburg, Ingo and Mathur, Sanjay (2015). Design of Volatile Mixed-Ligand Tantalum(V) Compounds as Precursors to Ta2O5 Films. Cryst. Growth Des., 15 (3). S. 1141 - 1150. WASHINGTON: AMER CHEMICAL SOC. ISSN 1528-7505

Appel, Linus, Leduc, Jennifer, Webster, Christopher L., Ziller, Joseph W., Evans, William J. and Mathur, Sanjay (2015). Synthesis of Air-Stable, Volatile Uranium(IV) and (VI) Compounds and Their Gas-Phase Conversion To Uranium Oxide Films. Angew. Chem.-Int. Edit., 54 (7). S. 2209 - 2214. WEINHEIM: WILEY-V C H VERLAG GMBH. ISSN 1521-3773

Appel, Linus, Leduc, Jennifer, Webster, Christopher L., Ziller, Joseph W., Evans, William J. and Mathur, Sanjay (2015). Synthesis of Air-Stable, Volatile Uranium(IV) and (VI) Compounds and Their Gas-Phase Conversion To Uranium Oxide Films. Angew. Chem.-Int. Edit., 54 (7). S. 2209 - 2214. WEINHEIM: WILEY-V C H VERLAG GMBH. ISSN 1521-3773

Fiz, Raquel, Appel, Linus, Gutierrez-Pardo, Antonio ORCID: 0000-0002-6206-1509, Ramirez-Rico, Joaquin ORCID: 0000-0002-1184-0756 and Mathur, Sanjay (2016). Electrochemical Energy Storage Applications of CVD Grown Niobium Oxide Thin Films. ACS Appl. Mater. Interfaces, 8 (33). S. 21423 - 21431. WASHINGTON: AMER CHEMICAL SOC. ISSN 1944-8244

Graf, David, Queralto, Albert ORCID: 0000-0001-9101-0033, Lepcha, Ashish, Appel, Linus, Frank, Michael and Mathur, Sanjay (2020). Electrospun SrNb2O6 photoanodes from single-source precursors for photoelectrochemical water splitting. Sol. Energy Mater. Sol. Cells, 210. AMSTERDAM: ELSEVIER. ISSN 1879-3398

Thesis Abstract

Appel, Linus (2015). Synthesis and Characterization of Niobium, Tantalum and Uranium Precursors for Metal Oxide Depositions. Thesis Abstract, Universität zu Köln.

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