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Sasinska, Alexander, Ritschel, Daniel, Czympiel, Lisa and Mathur, Sanjay (2017). Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors. Adv. Eng. Mater., 19 (2). WEINHEIM: WILEY-V C H VERLAG GMBH. ISSN 1527-2648

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