Universität zu Köln

Juergensen, Lasse, Frank, Michael, Graf, David ORCID: 0000-0002-0504-8527, Gessner, Isabel, Fischer, Thomas, Welter, Katharina, Jaegermann, Wolfram and Mathur, Sanjay (2020). Nanostructured IrOx Coatings for Efficient Oxygen Evolution Reactions in PV-EC Setup. Z. Phys. Chemie-Int. J. Res. Phys. Chem. Chem. Phys., 234 (5). S. 911 - 925. BERLIN: WALTER DE GRUYTER GMBH. ISSN 0942-9352

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Abstract

New heteroleptic iridium compounds exhibiting high volatility and defined thermal decomposition behavior were developed and tested in plasma-enhanced chemical vapor deposition (PECVD). The iridium precursor [(COD)Ir(TFB-TFEA)] (COD = 1,5-cyclooctadiene; TFB-TFEA = N-(4,4,4-Trifluorobut-1-en-3-on)-6,6,6-trifluoroethylamin) unifies both reactivity and sufficient stability through its heteroleptic constitution to offer a step-by-step elimination of ligands to provide high compositional purity in CVD deposits. The substitution of neutral COD ligands against CO groups further increased the volatility of the precursor. PECVD experiments with unambiguously characterized Ir compounds (single crystal X-ray diffraction analysis) demonstrated their suitability for an atom-efficient (high molecule-to-precursor yield) gas phase deposition of amorphous iridium oxide (IrOx) phases. Thin films of IrOx were well suited as electrocatalyst in oxygen evolution reaction so that an efficient coupled system in combination with solar cells is viable to perform water-splitting reaction without external bias.

Item Type:	Journal Article
Creators:	Creators Email ORCID ORCID Put Code Juergensen, Lasse UNSPECIFIED UNSPECIFIED UNSPECIFIED Frank, Michael UNSPECIFIED UNSPECIFIED UNSPECIFIED Graf, David UNSPECIFIED orcid.org/0000-0002-0504-8527 UNSPECIFIED Gessner, Isabel UNSPECIFIED UNSPECIFIED UNSPECIFIED Fischer, Thomas UNSPECIFIED UNSPECIFIED UNSPECIFIED Welter, Katharina UNSPECIFIED UNSPECIFIED UNSPECIFIED Jaegermann, Wolfram UNSPECIFIED UNSPECIFIED UNSPECIFIED Mathur, Sanjay UNSPECIFIED UNSPECIFIED UNSPECIFIED
URN:	urn:nbn:de:hbz:38-335312
DOI:	10.1515/zpch-2019-1450
Journal or Publication Title:	Z. Phys. Chemie-Int. J. Res. Phys. Chem. Chem. Phys.
Volume:	234
Number:	5
Page Range:	S. 911 - 925
Date:	2020
Publisher:	WALTER DE GRUYTER GMBH
Place of Publication:	BERLIN
ISSN:	0942-9352
Language:	English
Faculty:	Faculty of Mathematics and Natural Sciences
Divisions:	Faculty of Mathematics and Natural Sciences > Department of Chemistry > Institute of Inorganic Chemistry
Subjects:	no entry
Uncontrolled Keywords:	Keywords Language CHEMICAL-VAPOR-DEPOSITION; WATER OXIDATION; IRIDIUM OXIDE; THIN-FILMS; ELECTROCATALYSTS; ELECTROLYSIS; URANIUM(IV); DISSOLUTION; VALIDATION; PRECURSORS Multiple languages Chemistry, Physical Multiple languages
Refereed:	Yes
URI:	http://kups.ub.uni-koeln.de/id/eprint/33531