Juergensen, Lasse, Frank, Michael, Graf, David ORCID: 0000-0002-0504-8527, Gessner, Isabel, Fischer, Thomas, Welter, Katharina, Jaegermann, Wolfram and Mathur, Sanjay (2020). Nanostructured IrOx Coatings for Efficient Oxygen Evolution Reactions in PV-EC Setup. Z. Phys. Chemie-Int. J. Res. Phys. Chem. Chem. Phys., 234 (5). S. 911 - 925. BERLIN: WALTER DE GRUYTER GMBH. ISSN 0942-9352

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Abstract

New heteroleptic iridium compounds exhibiting high volatility and defined thermal decomposition behavior were developed and tested in plasma-enhanced chemical vapor deposition (PECVD). The iridium precursor [(COD)Ir(TFB-TFEA)] (COD = 1,5-cyclooctadiene; TFB-TFEA = N-(4,4,4-Trifluorobut-1-en-3-on)-6,6,6-trifluoroethylamin) unifies both reactivity and sufficient stability through its heteroleptic constitution to offer a step-by-step elimination of ligands to provide high compositional purity in CVD deposits. The substitution of neutral COD ligands against CO groups further increased the volatility of the precursor. PECVD experiments with unambiguously characterized Ir compounds (single crystal X-ray diffraction analysis) demonstrated their suitability for an atom-efficient (high molecule-to-precursor yield) gas phase deposition of amorphous iridium oxide (IrOx) phases. Thin films of IrOx were well suited as electrocatalyst in oxygen evolution reaction so that an efficient coupled system in combination with solar cells is viable to perform water-splitting reaction without external bias.

Item Type: Journal Article
Creators:
CreatorsEmailORCIDORCID Put Code
Juergensen, LasseUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Frank, MichaelUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Graf, DavidUNSPECIFIEDorcid.org/0000-0002-0504-8527UNSPECIFIED
Gessner, IsabelUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Fischer, ThomasUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Welter, KatharinaUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Jaegermann, WolframUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
Mathur, SanjayUNSPECIFIEDUNSPECIFIEDUNSPECIFIED
URN: urn:nbn:de:hbz:38-335312
DOI: 10.1515/zpch-2019-1450
Journal or Publication Title: Z. Phys. Chemie-Int. J. Res. Phys. Chem. Chem. Phys.
Volume: 234
Number: 5
Page Range: S. 911 - 925
Date: 2020
Publisher: WALTER DE GRUYTER GMBH
Place of Publication: BERLIN
ISSN: 0942-9352
Language: English
Faculty: Unspecified
Divisions: Unspecified
Subjects: no entry
Uncontrolled Keywords:
KeywordsLanguage
CHEMICAL-VAPOR-DEPOSITION; WATER OXIDATION; IRIDIUM OXIDE; THIN-FILMS; ELECTROCATALYSTS; ELECTROLYSIS; URANIUM(IV); DISSOLUTION; VALIDATION; PRECURSORSMultiple languages
Chemistry, PhysicalMultiple languages
URI: http://kups.ub.uni-koeln.de/id/eprint/33531

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