Universität zu Köln

Duchamp, V., Bastisch, I. and Schneider, P. M. (2015). Drop-out model optimization on degraded DNA samples. Forensic Sci. Int. Genet. Suppl. Ser., 5. S. E370 - 3. CLARE: ELSEVIER IRELAND LTD. ISSN 1875-175X

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Abstract

Two statistical models have been developed to interpret locus drop-out resulting from degraded DNA samples. These models are based on an experimental dataset of 600 genotyping experiments. The first model presents the probability of locus drop-out against the average peak height with a lower and upper confidence interval. For a given peak height average, the probability of drop-out can be quite wide. This probability decreases rapidly when the profile quality increases. For the second model, we have fitted the probability of locus drop-out against the number of base pairs with a lower and upper confidence interval. The probability of drop-out is increasing along with the number of base pairs. Despite DNA degradation effects, the drop-out probability does not get higher than 0.5. (C) 2015 Elsevier Ireland Ltd. All rights reserved.

Item Type:	Journal Article
Creators:	Creators Email ORCID ORCID Put Code Duchamp, V. UNSPECIFIED UNSPECIFIED UNSPECIFIED Bastisch, I. UNSPECIFIED UNSPECIFIED UNSPECIFIED Schneider, P. M. UNSPECIFIED UNSPECIFIED UNSPECIFIED
URN:	urn:nbn:de:hbz:38-384463
DOI:	10.1016/j.fsigss.2015.09.147
Journal or Publication Title:	Forensic Sci. Int. Genet. Suppl. Ser.
Volume:	5
Page Range:	S. E370 - 3
Date:	2015
Publisher:	ELSEVIER IRELAND LTD
Place of Publication:	CLARE
ISSN:	1875-175X
Language:	English
Faculty:	Unspecified
Divisions:	Unspecified
Subjects:	no entry
Uncontrolled Keywords:	Keywords Language Genetics & Heredity Multiple languages
URI:	http://kups.ub.uni-koeln.de/id/eprint/38446