Universität zu Köln

Singh, Aadesh P., Mettenboerger, Andreas, Golus, Peter and Mathur, Sanjay (2012). Photoelectrochemical properties of hematite films grown by plasma enhanced chemical vapor deposition. Int. J. Hydrog. Energy, 37 (19). S. 13983 - 13989. OXFORD: PERGAMON-ELSEVIER SCIENCE LTD. ISSN 1879-3487

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Abstract

Nanostructured alpha-Fe2O3 thin films were grown by plasma-enhanced chemical vapor deposition (PE-CVD) using iron pentacarbonyl (Fe(CO)(5)) as precursor. Influence of the plasma parameters on photoelectrochemical (PEG) properties of the resulting hematite thin films toward solar oxidation of water was investigated under one sun illumination in a basic (1 M NaOH) electrolyte. PEG data analyzed in conjunction with the data obtained by scanning electron microscopy, X-ray diffraction and Mott-Schottky analysis showed 100 W plasma power to be an optimal RF-power value for achieving a high photocurrent density of similar to 1098 mu A/cm(2) at 0.9 V/SCE external applied potential. The donor density, flat band potential, grain size and porosity of the films were observed to be highly affected by RF-power, which in turn resulted in enhanced photoresponse. Copyright (C) 2012, Hydrogen Energy Publications, LLC. Published by Elsevier Ltd. All rights reserved.

Item Type:	Journal Article
Creators:	Creators Email ORCID ORCID Put Code Singh, Aadesh P. UNSPECIFIED UNSPECIFIED UNSPECIFIED Mettenboerger, Andreas UNSPECIFIED UNSPECIFIED UNSPECIFIED Golus, Peter UNSPECIFIED UNSPECIFIED UNSPECIFIED Mathur, Sanjay UNSPECIFIED UNSPECIFIED UNSPECIFIED
URN:	urn:nbn:de:hbz:38-481415
DOI:	10.1016/j.ijhydene.2012.06.097
Journal or Publication Title:	Int. J. Hydrog. Energy
Volume:	37
Number:	19
Page Range:	S. 13983 - 13989
Date:	2012
Publisher:	PERGAMON-ELSEVIER SCIENCE LTD
Place of Publication:	OXFORD
ISSN:	1879-3487
Language:	English
Faculty:	Unspecified
Divisions:	Unspecified
Subjects:	no entry
Uncontrolled Keywords:	Keywords Language THIN-FILMS; WATER; OXIDE; PHOTOOXIDATION; ELECTRODES; PHOTOELECTROLYSIS Multiple languages Chemistry, Physical; Electrochemistry; Energy & Fuels Multiple languages
URI:	http://kups.ub.uni-koeln.de/id/eprint/48141