Universität zu Köln

Singh, Bhupendra ORCID: 0000-0002-0773-5312, Fischer, Thomas ORCID: 0000-0002-8363-9613 and Mathur, Sanjay ORCID: 0000-0003-2765-2693 (2025). Field-enhanced chemical vapor deposition: new perspectives for thin film growth. Journal of Materials Chemistry A, 13 (26). pp. 20104-20142. Royal Society of Chemistry. ISSN 2050-7488

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Abstract

Chemical vapor deposition (CVD) is a versatile technique for producing thin films and coatings of functional materials with diverse mechanical, electrochemical, electrical, tribological, and optical properties. The CVD process is governed by various experimental parameters including precursor chemistry, feed rate, growth temperature, pressure, and carrier or reactive gases. The growth kinetics depends on precursor decomposition that can be influenced by plasma-chemical or photo-dissociation processes to supplement thermal energy. More recently, the application of electric or magnetic fields during the CVD process has impacted the film growth beyond the conventional parametric space. This review highlights the influence of external field effects (plasma, photo-radiation, electric field, and magnetic field) on key steps of thin film processing, such as nucleation, grain growth, texture, density, phase formation, anisotropy, and kinetic stabilization. The emphasis is on recent technical, material, and phenomenological innovations in the CVD technique, with applied fields as extrinsic processing parameters offering new insights into future directions in the research and development of high-fidelity functional films and coatings.

Item Type:	Article
Creators:	Creators Email ORCID ORCID Put Code Singh, Bhupendra UNSPECIFIED https://orcid.org/0000-0002-0773-5312 UNSPECIFIED Fischer, Thomas UNSPECIFIED https://orcid.org/0000-0002-8363-9613 UNSPECIFIED Mathur, Sanjay UNSPECIFIED https://orcid.org/0000-0003-2765-2693 UNSPECIFIED
URN:	urn:nbn:de:hbz:38-812077
Identification Number:	10.1039/D5TA01081K
Journal or Publication Title:	Journal of Materials Chemistry A
Volume:	13
Number:	26
Page Range:	pp. 20104-20142
Number of Pages:	39
Date:	14 July 2025
Publisher:	Royal Society of Chemistry
ISSN:	2050-7488
Language:	English
Faculty:	Faculty of Mathematics and Natural Sciences
Divisions:	Faculty of Mathematics and Natural Sciences > Department of Chemistry > Institute of Inorganic Chemistry
Subjects:	Chemistry and allied sciences
['eprint_fieldname_oa_funders' not defined]:	Publikationsfonds UzK
Refereed:	Yes
URI:	http://kups.ub.uni-koeln.de/id/eprint/81207